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date: 19.12.2014heure:12:00 1.5 date de l’ouverture des offres:
date: 10.08.2015time of day:11:00,specific deadlines and formal requirements:meeting for getting acquainted with technical data of the bids and the information about the participants
appareillage de pulvérisation magnétron, cathode cylindrique et méthod de depot des multicouches minces sur un substrat
magnetron sputtering device, cylinder cathode and a method of applying thin multi-component films to a substrate
methode et dispositif de determination du seuil de depot des fractions lourdes contenues dans un fluide hydrocarbone liquide
method and device for determining the threshold of heavy fraction deposit contained in a liquid hydrocarbon fluid
appareillage de pulvérisation magnétron, cathode cylindrique et méthod de depot des couches minces de matériaux différents sur un substrat
magnetron sputtering device, cylinder cathode and a method of applying thin films of different materials to a substrate
reacteur destine au depot des couches minces et procede de depot des couches minces sur une plaquette mettant en oeuvre le reacteur
reactor for thin film deposition and method for depositing thin film on wafer using the reactor