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lithography: 15 / 16
lithography: 19 / a19

processor lithography: 14 / 22
processor lithography: 14 / 22 / 32

so, to accomplish a project goal, an experimental model of lithography setup has to be made.
so, to accomplish a project goal, an experimental model of lithography setup has to be made.

in the frame of international collaboration pti participates in the european works related to euv-lithography.
in the frame of international collaboration pti participates in the european works related to euv-lithography.

collaboration and information exchange with american, japanese and european teams involved in projection lithography are considered as important parts of the project.
collaboration and information exchange with american, japanese and european teams involved in projection lithography are considered as important parts of the project.

6520,* optical lithography thirty years and three orders of magnitude: the evolution of optical lithography tools.
the resolution in proximity lithography is approximately the square root of the product of the wavelength and the gap distance.

at the same time, in our opinion, the most important and undeveloped area of euv projection lithography is a problem of photoresist in a corresponding spectral range having high sensitivity and contrast.
at the same time, in our opinion, the most important and undeveloped area of euv projection lithography is a problem of photoresist in a corresponding spectral range having high sensitivity and contrast.

the mask is supposed to be manufactured by traditional electron lithography methods, and its image will be demagnified by a factor of m=5-20.
the mask is supposed to be manufactured by traditional electron lithography methods, and its image will be demagnified by a factor of m=5-20.

mapper lithography более 10 лет разрабатывает технологии электронно-лучевой безмасочной литографии и уже имеет несколько промышленных прототипов литографа, которые были приобретены и проходили тестирование у ведущих игроков отрасли - тайваньской компании tsmc и научно-исследовательского института микроэлектроники cea-leti (Франция).
mapper lithography more than 10 years developing the technology of electron-beam lithography mask-free and already has several industrial prototypes lithographer, which were purchased and were tested by the leading players in the industry - taiwan’s tsmc and research institute of microelectronics cea-leti (france).