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chronoamperometrische und chronopotentiometrische messungen zur kontrolle und steuerung von galvanischen kupferabscheidungen.
time-current and time-potential measurements for controlling and regulating galvanic copper deposition.
Last Update: 2014-11-28
Usage Frequency: 2
Quality:
kupferabscheidung in der mikroelektronik
copper electrodeposition in microelectronics
Last Update: 2014-11-28
Usage Frequency: 4
Quality: