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darauf wird mittels eines 248 nm-projektionsbelichtungsgerätes bei einer dosis von 20 mj/cm das bild einer maske projiziert, welche steg/ graben-strukturen im raster von 0,40 bis 0,14 µm aufweist.
projected onto this wafer using a 248 nm projection exposure unit at a dose of 20 mj/cm2 is the image of a mask having line/space structures in the grating from 0.40 to 0.14 μm.
Last Update: 2014-12-03
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