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method and apparatus for determining process layer conformality
method and apparatus for determining process layer conformality

the data processing unit (225) is adapted to determine conformality of the process layer (410) based on the generated reflection profile.
the data processing unit (225) is adapted to determine conformality of the process layer (410) based on the generated reflection profile.

le procédé décrit permet de déterminer la conformité d'une couche process (410) comprenant une plaquette (205) présentant une structure de grillage (400) et une process layer (410) formée sur la structure de grillage (400); illuminant au moins une partie de la process layer (410) overlying the grating structure (400) with a light source (222); measuring light reflected from the illuminated portion of the grating structure (400) and the process layer (410) to generate a reflection profile; and determining conformality of the process layer (410) based on the reflection profile.
a method for determining conformality of a process layer (410) includes providing a wafer (205) having a grating structure (400) and a process layer (410) formed over the grating structure (400); illuminating at least a portion of the process layer (410) overlying the grating structure (400) with a light source (222); measuring light reflected from the illuminated portion of the grating structure (400) and the process layer (410) to generate a reflection profile; and determining conformality of the process layer (410) based on the reflection profile.