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invoice additional feature

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Frans

* 955x (glenwood)** update for 925x, avec additional features of "lakeport" eg.

Engels

* 955x (lakeport)** update for 925x, with additional features of "lakeport" (e.g., pat features and ecc memory), and uses ddr2.

Laatste Update: 2016-03-03
Gebruiksfrequentie: 1
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Frans

optical improvements include features that intentionally defocus the laser stripe on the wafer (102) as well as additional features that help ensure precision stripe generation.

Engels

optical improvements include features that intentionally defocus the laser stripe on the wafer (102) as well as additional features that help ensure precision stripe generation.

Laatste Update: 2014-12-03
Gebruiksfrequentie: 1
Kwaliteit:

Frans

o97-0863 0047 1997/05/15 1997/06/23 tg centrex systems - provide additional features.

Engels

o97-0863 0047 1997/05/15 1997/06/23 gt centrex systems - provide additional features.

Laatste Update: 2015-05-14
Gebruiksfrequentie: 1
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Frans

an improved laser-based wafer carrier mapping sensor (100) is provided. the sensor (100) includes a number of improvements including laser source improvements; optical improvements; and detector improvements. laser source (106, 108) improvements include the type of laser sources used as well as the specification of size and power of such sources (106, 108). optical improvements include features that intentionally defocus the laser stripe on the wafer (102) as well as additional features that help ensure precision stripe generation. detector improvements include increasing gain while decreasing the effects of ambient light. various combinations of these features provide additional synergies that facilitate the construction of a sensor (100) with significantly improved dynamic response while decreasing the frequency of false cross slot errors.

Engels

an improved laser-based wafer carrier mapping sensor (100) is provided. the sensor (100) includes a number of improvements including laser source improvements; optical improvements; and detector improvements. laser source (106, 108) improvements include the type of laser sources used as well as the specification of size and power of such sources (106, 108). optical improvements include features that intentionally defocus the laser stripe on the wafer (102) as well as additional features that help ensure precision stripe generation. detector improvements include increasing gain while decreasing the effects of ambient light. various combinations of these features provide additional synergies that facilitate the construction of a sensor (100) with significantly improved dynamic response while decreasing the frequency of false cross slot errors.

Laatste Update: 2011-07-27
Gebruiksfrequentie: 1
Kwaliteit:

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