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"substrater" specificeret i 3c005 med mindst ét epitaksialt lag af siliciumcarbid, galliumnitrid, aluminiumnitrid eller aluminiumgalliumnitrid.
"substrates" specified in 3c005 with at least one epitaxial layer of silicon carbide, gallium nitride, aluminium nitride or aluminium gallium nitride.
Last Update: 2014-11-21
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"substrater" af siliciumkarbid (sic), galliumnitrid (gan), aluminiumnitrid (aln) eller aluminiumgalliumnitrid (algan) eller ingots, boules eller andre preforms af disse materialer, med resistiviteter større end 10000 ohm-cm ved 20 °c.
silicon carbide (sic), gallium nitride (gan), aluminium nitride (aln) or aluminium gallium nitride (algan) "substrates", or ingots, boules, or other preforms of those materials, having resistivities greater than 10000 ohm-cm at 20 °c.
Last Update: 2014-11-21
Usage Frequency: 1
Quality:
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